Wen-Chang Shih is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of polishing technology, holding a total of 14 patents. His work focuses on developing advanced polishing pads and methods that enhance efficiency and effectiveness in various applications.

Latest Patents

Among his latest patents is a unique polishing pad that features a polishing layer and a detection window. This detection window is strategically placed within the polishing layer, with its modulus being larger at 30°C and smaller at 50°C compared to the polishing layer. Another notable patent involves a method for fabricating a polishing pad that includes a compressibility-aiding stripe. This process entails assembling the stripe in a mold cavity, filling it with a polymer material, and subsequently releasing the polishing pad from the mold. These innovations reflect his commitment to improving polishing technologies.

Career Highlights

Wen-Chang Shih has worked with several companies throughout his career, including Iv Technologies Co., Ltd. and Likely Medical International Inc. His experience in these organizations has allowed him to refine his skills and contribute to the development of cutting-edge technologies in the polishing industry.

Collaborations

Throughout his career, Shih has collaborated with notable colleagues, including Yung-Chung Chang and Min-Kuei Chu. These partnerships have fostered a creative environment that has led to the successful development of innovative products.

Conclusion

Wen-Chang Shih's contributions to polishing technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to influence the industry and pave the way for future advancements.

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