The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 25, 2011
Filed:
Apr. 24, 2006
Applicants:
Wen-chang Shih, TaiChung, TW;
Yung-chung Chang, Taipei, TW;
Min-kuei Chu, Taichung, TW;
Lung-chen Wei, Taichung, TW;
Inventors:
Wen-Chang Shih, TaiChung, TW;
Yung-Chung Chang, Taipei, TW;
Min-Kuei Chu, Taichung, TW;
Lung-Chen Wei, Taichung, TW;
Assignee:
IV Technologies Co., Ltd., Taiching, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 3/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention provides a polishing pad. The polishing pad comprises a transparent part and a high molecular weight layer. The transparent part has an uneven side surface and the profile of the uneven side surface is selected from a group consisting of a serrated shape, a wavy shape and a toothed shape. The high molecular weight layer encircles the transparent part.