Weimin Hu

Title: Innovations by Weimin Hu in Overlay Control Technology

Introduction: Weimin Hu is a notable inventor based in Hsinchu, Taiwan, recognized for his contributions to the field of semiconductor manufacturing. With a focus on enhancing the precision of overlay control, Weimin holds a total of three patents that highlight his commitment to innovation and technological advancement.

Latest Patents: Among Weimin's latest inventions is a patent related to noise reduction for overlay control. This innovative system features a metrology tool specifically designed to collect overlay errors from a patterned substrate. It employs a controller module that generates overlay compensation by identifying a portion of the overlay errors as outliers, distinguishing noise not caused by reticle effects, and filtering these errors to create more accurate overlay compensations.

Another patent from Weimin encompasses a method designed to improve overlay accuracy during the substrate patterning process. This method includes collecting overlay errors from multiple fields on the substrate, applying distinct filtering operations to identify noise, and subsequently grouping the filtered errors. This systematic approach leads to calculating precise overlay compensation and ensuring accurate adjustments to the patterning tool.

Career Highlights: Weimin Hu is currently affiliated with Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work has been instrumental in pushing the boundaries of overlay control technology, which is vital for the advancement of semiconductor fabrication processes.

Collaborations: Throughout his career, Weimin has collaborated with notable professionals in the industry, including Yang-Hung Chang and Kai-Hsiung Chen. Their teamwork has fostered an environment of innovation, leading to significant advancements in overlay control methodologies.

Conclusion: Weimin Hu's contributions to the field of semiconductor technology, particularly through his innovative patents on overlay control, mark him as a forward-thinking inventor. His work not only enhances the accuracy of semiconductor manufacturing processes but also exemplifies the importance of collaboration and innovation in driving technological advancements.