The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 29, 2022
Filed:
Jun. 15, 2020
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Weimin Hu, Hsinchu, TW;
Yang-Hung Chang, Taipei, TW;
Kai-Hsiung Chen, New Taipei, TW;
Chun-Ming Hu, Hsin-Chu, TW;
Chih-Ming Ke, Hsinchu, TW;
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Abstract
The present disclosure provides a system. The system includes a metrology tool configured to collect overlay errors from a patterned substrate; and a controller module coupled to the metrology tool and configured to generate an overlay compensation from the collected overlay errors, wherein the generating of the overlay compensation includes identifying a portion of the overlay errors as a set of outliers, identifying inside the set of outliers overlay errors not due to reticle effects, thereby creating a set of noise, excluding the set of noise from overlay errors, thereby creating a set of filtered overlay errors, and calculating the overlay compensation based on the set of filtered overlay errors.