This inventor holds 2 USPTO granted patents and 2 published patent applications. Top assignee: Spts Technologies Limited. Active years: 2025.
Company Filing History:
Years Active: 2025
Title: Weikang Fan: Innovator in Plasma Etching Technology
Introduction
Weikang Fan is a notable inventor based in Newport, GB. He has made significant contributions to the field of semiconductor technology, particularly in plasma etching processes. With a total of 2 patents to his name, Fan's work has advanced the methods used in the fabrication of compound semiconductors.
Latest Patents
Weikang Fan's latest patents include innovative methods for the post-processing of indium-containing compound semiconductors. One of his patents describes a method of plasma etching an indium-containing compound semiconductor substrate, which utilizes both a primary and a secondary plasma etching process. The primary process employs a halogen-containing component along with a nitrogen-containing component, while the secondary process incorporates an oxygen-containing component. Another patent focuses on the plasma etching of a compound semiconductor substrate, detailing the introduction of an etchant gas or gas mixture into a chamber. This process sustains a plasma of the etchant gas, allowing for effective plasma etching of the compound semiconductor material. A pulsed electrical bias power is applied to the substrate support during this process, with specific parameters for pulse frequency and duty cycle.
Career Highlights
Weikang Fan is currently employed at SPTS Technologies Limited, where he continues to develop and refine plasma etching technologies. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Collaborations
Weikang has collaborated with several talented individuals in his field, including Stephan Shannon L Lilje and Adam S Beachey. These collaborations have contributed to the advancement of innovative solutions in semiconductor technology.
Conclusion
Weikang Fan's contributions to plasma etching technology have positioned him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to influence the development of advanced manufacturing techniques.