Miyagi, Japan

Weichien Chen

This inventor holds 1 USPTO granted patent. Top assignee: Tokyo Electron Limited. Active years: 2019.


% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Weichien Chen: Innovator in Plasma Processing Technology

Introduction

Weichien Chen is a notable inventor based in Miyagi, Japan. He has made significant contributions to the field of plasma processing, particularly with his innovative methods that enhance the efficiency of semiconductor manufacturing.

Latest Patents

Weichien Chen holds 1 patent for a plasma processing method. This method involves processing a workpiece that includes a silicon-containing etching target layer, an organic film, an antireflective film, and a first mask. The process utilizes a plasma processing apparatus to etch these layers effectively, ensuring precision in semiconductor fabrication.

Career Highlights

Chen is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on developing advanced plasma processing techniques that are crucial for modern electronics manufacturing.

Collaborations

Some of his coworkers include Ryosuke Niitsuma and Shinya Morikita, who contribute to the innovative environment at Tokyo Electron Limited.

Conclusion

Weichien Chen's contributions to plasma processing technology exemplify the importance of innovation in the semiconductor industry. His work continues to influence advancements in manufacturing processes, showcasing the vital role of inventors in technological progress.

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