Company Filing History:
Years Active: 2022-2025
Title: Innovations by Inventor Wei Si
Introduction
Wei Si is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of defect detection in various specimens. With a total of 2 patents, his work showcases innovative methods and systems that enhance the accuracy and efficiency of defect detection processes.
Latest Patents
Wei Si's latest patents include groundbreaking technologies. One of his patents focuses on "Detecting defects on specimens." This patent provides methods and systems for detecting defects, utilizing a double detection system that compares reference images to test images. The system can generate computed reference images from multiple images, enhancing the detection process. Additionally, it groups images based on color to optimize the inspection process.
Another notable patent is "Print check repeater defect detection." This invention includes systems and methods for detecting defects on a reticle during the lithography process. The system identifies defects at corresponding locations in multiple test images, employing double detection and stacked defect detection techniques. This innovative approach allows for the identification of final repeater defect candidates, improving the overall defect detection on reticles.
Career Highlights
Wei Si is currently employed at Kla Corporation, where he continues to develop and refine his innovative technologies. His work at Kla Corporation has positioned him as a key player in the field of defect detection, contributing to advancements that benefit various industries.
Collaborations
Wei Si collaborates with talented individuals such as Xiaochun Li and Hong Chen. These collaborations enhance the innovative environment at Kla Corporation, fostering the development of cutting-edge technologies.
Conclusion
Wei Si's contributions to defect detection through his patents demonstrate his commitment to innovation and excellence. His work not only advances technology but also sets a standard for future developments in the field.