Wei-Shuo Su

Title: Wei-Shuo Su: Innovator in Semiconductor Manufacturing

Introduction

Wei-Shuo Su is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His innovative work focuses on enhancing the efficiency and effectiveness of semiconductor processes.

Latest Patents

Wei-Shuo Su's latest patents include a method of manufacturing photo masks and a tunable illuminator for lithography systems. The method of manufacturing photo masks involves acquiring a mask pattern layout with multiple patterns. These patterns are converted into a graph with nodes and links, determining if the nodes can be colored by N colors without adjacent nodes sharing the same color. If successful, the nodes are colored, and the patterns are classified into N groups for assignment to N photo masks. The tunable illuminator for lithography systems features an extreme ultraviolet illumination source that generates a beam to pattern a resist layer on a substrate. The illuminator directs this beam onto a photomask surface, utilizing a field facet mirror and a pupil facet mirror to enhance the illumination process.

Career Highlights

Wei-Shuo Su is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading entity in the semiconductor industry. His work has been instrumental in advancing technologies that are critical for modern electronics.

Collaborations

Some of his notable coworkers include Ken-Hsien Hsieh and Ru-Gun Liu, who have collaborated with him on various projects within the semiconductor field.

Conclusion

Wei-Shuo Su's contributions to semiconductor manufacturing through his innovative patents and collaborations highlight his role as a key figure in the industry. His work continues to influence advancements in technology and manufacturing processes.