Company Filing History:
Years Active: 2017-2019
Title: Wei-Ning Chen: Innovator in Semiconductor Technology
Introduction
Wei-Ning Chen is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on innovative structures and manufacturing methods that enhance semiconductor performance.
Latest Patents
One of Wei-Ning Chen's latest patents is centered around a semiconductor structure and its manufacturing method. This invention includes a sophisticated semiconductor structure that comprises an isolation layer, a gate dielectric layer, a tantalum nitride layer, a tantalum oxynitride layer, an n type work function metal layer, and a filling metal. The isolation layer is strategically formed on a substrate and features a first gate trench. Within this trench, the gate dielectric layer is established, followed by the formation of the tantalum nitride layer on top. The tantalum oxynitride layer is then applied over the tantalum nitride layer. The n type work function metal layer is positioned on the tantalum oxynitride layer within the first gate trench, and finally, the filling metal is placed atop the n type work function metal layer in the same trench.
Career Highlights
Wei-Ning Chen is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His expertise and innovative approach have positioned him as a key player in the development of advanced semiconductor technologies.
Collaborations
Throughout his career, Wei-Ning Chen has collaborated with notable colleagues, including Shih-Min Chou and Yun-Tzu Chang. These partnerships have fostered a collaborative environment that enhances the innovation process.
Conclusion
Wei-Ning Chen's contributions to semiconductor technology exemplify the impact of innovative thinking in the field. His patents reflect a commitment to advancing technology and improving semiconductor structures. His work continues to influence the industry and inspire future innovations.