This inventor holds 2 USPTO granted patents. Top assignees: Applied Materials, Inc., Other. Active years: 2004.
Company Filing History:
1 out of 14,391 
1 out of 834,307 Years Active: 2004
Title: Innovations by Wei-Nan Jiang
Introduction
Wei-Nan Jiang is a notable inventor based in San Jose, CA (US). He has made significant contributions to the field of substrate processing, holding a total of 2 patents. His work focuses on improving methods and apparatuses for substrate monitoring and etching processes.
Latest Patents
Wei-Nan Jiang's latest patents include a substrate monitoring method and apparatus. This invention involves a substrate processing apparatus that comprises a chamber capable of processing a substrate. A radiation source provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector is provided to detect the reflected radiation and generate a signal. A controller is adapted to receive the signal and determine a property of the substrate in situ during processing, before an onset of during or after processing of a material on the substrate. Another significant patent is a self-cleaning process for etching silicon-containing material. This method involves placing the substrate in a process chamber and exposing it to an energized gas comprising fluorine-containing gas, chlorine-containing gas, and sidewall-passivation gas. The silicon-containing material on the substrate comprises regions having different compositions, and the volumetric flow ratio of the gases is selected to etch the compositionally different regions at substantially similar etch rates.
Career Highlights
Wei-Nan Jiang has worked with Applied Materials, Inc., where he has contributed to advancements in substrate processing technologies. His experience in this leading company has allowed him to refine his innovative approaches to substrate monitoring and etching processes.
Collaborations
Throughout his career, Wei-Nan Jiang has collaborated with notable professionals in the field, including Jeffrey D. Chinn and Jitske Trevor. These collaborations have further enhanced his work and contributed to the development of his patents.
Conclusion
Wei-Nan Jiang's contributions to substrate processing through his innovative patents demonstrate his expertise and commitment to advancing technology in this field. His work continues to influence the industry and pave the way for future innovations.