The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 30, 2004
Filed:
Apr. 06, 2000
Applicant:
Inventors:
Thorsten B. Lill, Sunnyvale, CA (US);
Michael N. Grimbergen, Redwood City, CA (US);
Jitske Trevor, Sunnyvale, CA (US);
Wei-Nan Jiang, San Jose, CA (US);
Jeffrey Chinn, Foster City, CA (US);
Assignee:
Applied Materials Inc, Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 ; B05C 1/100 ; C23C 1/454 ;
U.S. Cl.
CPC ...
H05H 1/00 ; B05C 1/100 ; C23C 1/454 ;
Abstract
A substrate processing apparatus comprises a chamber capable of processing a substrate . A radiation source provides radiation that is at least partially reflected from the substrate in the chamber. A radiation detector is provided to detect the reflected radiation and generate a signal. A controller is adapted to receive the signal and determine a property of the substrate in situ during processing, before an onset of during or after processing of a material on the substrate