Wei Ming Chiew

Title: Wei Ming Chiew: Innovator in Optical Metrology

Introduction

Wei Ming Chiew is a notable inventor based in Singapore, recognized for his contributions to the field of optical metrology. His innovative work focuses on enhancing the accuracy of optical measurements, which is crucial in various scientific and industrial applications.

Latest Patents

Wei Ming Chiew holds a patent titled "Mitigation of undesired spectral effects in optical metrology." This invention addresses the optical measurement of a sample that includes a structure-of-interest (SOI) optically coupled to an unknown structure. The method involves extracting spectral variations correlated to key parameters associated with the SOI and removing irrelevant spectral variations from the unknown structure. An offline process is utilized to create a physics-based model from calibration measurements, while a machine learning model may also be generated using the relevant spectral variations. In an in-line process, the sample is measured by filtering spectral signals to eliminate effects from the unknown structure, employing either the physics-based model or the trained machine learning model.

Career Highlights

Wei Ming Chiew is currently employed at Onto Innovation Inc., where he continues to develop innovative solutions in optical measurement technologies. His work has significantly contributed to advancements in the field, showcasing his expertise and commitment to innovation.

Collaborations

Some of his notable coworkers include Petar Žuvela and Jingsheng Shi, who collaborate with him on various projects within the company.

Conclusion

Wei Ming Chiew's contributions to optical metrology exemplify the impact of innovative thinking in technology. His patent and ongoing work at Onto Innovation Inc. highlight his role as a key figure in advancing measurement techniques.