Tainan, Taiwan

Wei-Li Hu

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2018-2025

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12 patents (USPTO):

Title: Innovations of Wei-Li Hu in Semiconductor Technology

Introduction

Wei-Li Hu is a prominent inventor based in Tainan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on advancements in image sensor devices and manufacturing methods that enhance performance and efficiency.

Latest Patents

Wei-Li Hu's latest patents include a semiconductor structure and a method of manufacturing the same. One notable invention is an image sensor device that features a semiconductor substrate divided into sensing units by a trench isolation structure. Each sensing unit comprises a first and second gate electrode, with pixels extending into the substrate. This design allows for improved electrical connections and functionality. Another significant patent involves a method for manufacturing an image sensor that includes forming a FinFET transfer gate with multiple channel fins. This innovation enhances the control over the transfer of electrons, resulting in faster pixel sensor performance and reduced leakage current.

Career Highlights

Throughout his career, Wei-Li Hu has worked with notable companies, including Taiwan Semiconductor Manufacturing Company Limited. His expertise in semiconductor technology has positioned him as a key figure in the industry, contributing to advancements that benefit various applications.

Collaborations

Wei-Li Hu has collaborated with esteemed colleagues, including Yun-Wei Cheng and Kuo-Cheng Lee. These partnerships have fostered innovation and the development of cutting-edge technologies in the semiconductor field.

Conclusion

Wei-Li Hu's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to shape the future of image sensor devices and manufacturing methods, demonstrating the importance of innovation in this field.

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