Wei-Hsu Wang

Title: **Innovator Wei-Hsu Wang: Revolutionizing CVD Machine Cleaning Methods**

Introduction

Wei-Hsu Wang is a notable inventor based in Kao-Hsiung Hsien, Taiwan. With a keen focus on enhancing manufacturing processes, he has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative approach has led to the development of a patented method that improves the efficiency and effectiveness of cleaning CVD machines.

Latest Patents

Wei-Hsu Wang holds a patent for a "Method of cleaning a chamber of a CVD machine and elements within." This invention provides a comprehensive cleaning process that begins with the injection of a gas mixture comprising carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) into the chamber. Following this, surface treatment is performed, which may involve sandblasting or polishing the elements' surfaces. Wang's method also includes immersing the elements in a cleaning solution containing ammonia water (NH4OH) and hydrogen peroxide (H2O2), maintained at temperatures between 40°C to 70°C. The cleaning solution's temperature can then be increased to remove residual layers from the surfaces of the heater and process kits, enhancing the overall cleaning process.

Career Highlights

Wei-Hsu Wang is associated with United Microelectronics Corporation (UMC), where he has played a vital role in advancing semiconductor manufacturing technologies. His pioneering work, particularly in cleaning methods, showcases his commitment to improving efficiency and reducing downtime in production settings.

Collaborations

Throughout his career, Wang has collaborated with talented colleagues such as Tsan-Chi Chu and Cheng-Yuan Yao. These collaborations have fostered a creative environment that encourages innovation and the sharing of ideas, which has contributed to the success of their projects and advancements in CVD technology.

Conclusion

Wei-Hsu Wang’s contributions to the semiconductor industry through his patented cleaning method demonstrate the impact of innovative thinking in enhancing manufacturing processes. His work not only improves equipment efficiency but also exemplifies the importance of collaboration and continuous improvement in technology. As he continues to push the boundaries of invention in the CVD field, his influence will undoubtedly resonate within the industry and inspire future innovations.