The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 27, 2003
Filed:
Apr. 25, 2001
Wei-Hsu Wang, Kao-Hsiung Hsien, TW;
Tsan-Chi Chu, Hsin-Chu, TW;
Cheng-Yuan Yao, Ping-Tung Hsien, TW;
Wei-Hao Lee, Tai-Chung, TW;
Ping-Chung Chung, Hsin-Chu Hsien, TW;
United Microelectronics Corp., Hsin-Chu, TW;
Abstract
The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF ) and perfluoro ethane (C F ) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH OH) and hydrogen peroxide (H O ) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.