Cheng-Yuan Yao

Title: Cheng-Yuan Yao: Innovator in CVD Machine Cleaning Methods

Introduction

Cheng-Yuan Yao is a notable inventor based in Ping-Tung Hsien, Taiwan. He has made significant contributions to the field of chemical vapor deposition (CVD) technology. His innovative approach to cleaning CVD machines has garnered attention in the industry.

Latest Patents

Cheng-Yuan Yao holds a patent for a method of cleaning a chamber of a CVD machine and elements within. The patent describes a process where a gas mixture of carbon tetrafluoride (CF₄) and perfluoroethane (C₂F₆) is injected into the chamber. Following this, a surface treatment is performed, which may include sandblasting or polishing the surfaces of the elements. The elements are then immersed in a cleaning solution that consists of ammonia water (NH₄OH) and hydrogen peroxide (H₂O₂) at a temperature maintained between 40°C to 70°C. Finally, the temperature of the cleaning solution is raised to facilitate the removal of any residual layers from the surfaces of the heater and process kits.

Career Highlights

Cheng-Yuan Yao is associated with United Microelectronics Corporation, a leading company in the semiconductor industry. His work focuses on enhancing the efficiency and effectiveness of CVD processes through innovative cleaning methods. His contributions have been instrumental in improving the operational capabilities of CVD machines.

Collaborations

Cheng-Yuan Yao has collaborated with notable colleagues such as Wei-Hsu Wang and Tsan-Chi Chu. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Cheng-Yuan Yao's innovative methods for cleaning CVD machines represent a significant advancement in semiconductor manufacturing technology. His contributions continue to influence the industry positively.