Tai-Chung, Taiwan

Wei-Hao Lee


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Wei-Hao Lee in CVD Machine Cleaning Technologies

Introduction: Wei-Hao Lee, an inventive mind based in Tai-Chung, Taiwan, is recognized for his innovative contributions to the field of chemical vapor deposition (CVD) machinery. With a focus on enhancing the efficiency and effectiveness of cleaning processes, Lee has made significant strides through his patented invention.

Latest Patents: Wei-Hao Lee holds a notable patent titled "Method of Cleaning a Chamber of a CVD Machine and Elements Within." This invention presents a comprehensive method for cleaning CVD machine chambers and internal elements. It involves the injection of a gas mixture comprised of carbon tetrafluoride (CF4) and perfluoroethane (C2F6) into the chamber. Following a surface treatment that includes either a sandblasting step or a polishing step, the elements are immersed in a cleaning solution made from ammonia water (NH4OH) and hydrogen peroxide (H2O2), maintained at temperatures between 40°C to 70°C. Ultimately, the temperature of the cleaning solution is increased to facilitate the removal of residual layers from the surfaces of the elements.

Career Highlights: Wei-Hao Lee is currently employed at United Microelectronics Corporation (UMC), a leading company in the semiconductor industry. Throughout his career, he has demonstrated a commitment to innovation and excellence in his field. His work has not only benefited his company but has also advanced the overall performance of CVD machines used in semiconductor manufacturing.

Collaborations: During his time at UMC, Lee has collaborated with fellow professionals, including Wei-Hsu Wang and Tsan-Chi Chu. These collaborations have fostered a productive environment that encourages the sharing of ideas and the pursuit of advanced technologies.

Conclusion: Wei-Hao Lee's inventive spirit is exemplified through his innovative methods for cleaning CVD chambers and components. With a patent that addresses significant challenges in semiconductor manufacturing, Lee continues to contribute to the evolution of technology within his industry. As he collaborates with other talented individuals, the potential for future innovations remains promising.

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