Wei-Han Chien

Title: The Innovative Mind of Wei-Han Chien: Enhancing Layout Patterns

Introduction: Wei-Han Chien, an accomplished inventor based in Kaohsiung, Taiwan, has made significant contributions to the field of layout pattern correction. With one notable patent under his name, Chien represents the innovative spirit that drives advancements in technology.

Latest Patents: Wei-Han Chien holds a patent for a novel method of correcting assist features within layout patterns. This method outlines a series of steps, beginning with the reception of a first layout pattern by a computer system, which is then divided into multiple first regions. Assist features are integrated into the initial layout, leading to the creation of a second layout pattern. The process defines certain features as selected patterns based on their proximity to the edges of the first regions. Following this, the second layout pattern is further segmented into second regions, where a check step is conducted, ultimately refining the layout into a corrected second layout pattern. This innovation enhances the efficiency and accuracy of layout designs.

Career Highlights: Wei-Han Chien is part of the renowned United Microelectronics Corporation, a leader in the semiconductor manufacturing industry. His work is instrumental in advancing the capabilities of layout pattern correction, showcasing his commitment to technological progress.

Collaborations: Throughout his career, Chien has collaborated with esteemed colleagues such as Tsung-Yeh Wu and Chin-Lung Lin. These partnerships highlight the collaborative efforts within the industry to foster innovation and improve methodologies in microelectronics.

Conclusion: Wei-Han Chien’s dedication to the enhancement of layout patterns through his innovative patent demonstrates the importance of invention in the technology sector. As he continues to work with notable companies and talented coworkers, Chien exemplifies the pioneering spirit that drives progress in the field of microelectronics.