United Microelectronics Corp.

Wei-Han Chien

Chin-Lung Lin

Yao-Jen Fan

Tsung-Yeh Wu

Chia-Chun Tsai

A method of correcting assist features includes the following steps. At first, a first layout pattern is received by a computer system, and the first layout pattern is split into a plurality of first regions. Subsequently, a plurality of assist features are added into the first layout pattern to form a second layout pattern, wherein at least one of the assist features neighboring any one of the edges of the first regions is defined as a selected pattern. Then, the second layout pattern is split into a plurality of second regions. Afterwards, a check step is performed on the second region including the selected pattern, and the second layout pattern is corrected to form a corrected second layout pattern.

Growing community of inventors

Kaohsiung, Taiwan

Wei-Han Chien