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For the Inventor, By the Inventor

San Jose, CA, United States of America

Wei Guang Lu

This inventor holds 36 USPTO granted patents and 10 published patent applications and 2 EPO patents, primarily in Chemical Mechanical Polishing. Top assignees: Applied Materials, Inc., Google Inc., Kla Tencor Corporation. Active years: 2006-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wei Guang Lu. Retrieved from https://idiyas.com/inventor/wei-guang-lu

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 36 

% Patents Active = 97.2

 

Average Co-Inventor Count = 4.2

ph-index = 6

Forward Citations = 275(Granted Patents)


Location History:

  • Bellevue, WA (US) (2020)
  • Sunnyvale, CA (US) (2021)
  • San Jose, CA (US) (2006 - 2023)
  • Santa Clara, CA (US) (2023)
  • Fremont, CA (US) (2010 - 2024)

Company Filing History:

goldMedal18 out of 14,544 
 
Applied Materials, Inc.
 patents
silverMedal4 out of 34,118 
 
Google Inc.
 patents
bronzeMedal4 out of 1,787 
 
Kla Tencor Corporation
 patents
4. 4 out of 56,402 
 
Microsoft Technology Licensing, LLC
 patents
5. 4 out of 5,122 
 
Xilinx, Inc.
 patents
6. 1 out of 624 
 
Kla Corporation
 patents
7. 1 out of 8 
 
Kla-Tenor Corp.
 patents

Years Active: 2006-2026

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Areas of Expertise:
Substrate Cleaning
Chemical Mechanical Polishing
Process Control Metrology
Wafer Edge Asymmetry
Inductive Monitoring
Signal Response Metrology
Measurement Optimization
Multi-layer Polishing Pad
Digital Phase Shift
High Speed Frequency Synthesizer
Programmable Logic Device
Machine Learning
36 patents (USPTO):Explore Patents
1. 12773756 - High performance CMP multidisk apparatus (2026-10-27),
2. 12703057 - Method for detection of wafer slippage (2026-08-11),
3. 12576475 - Determining the orientation of a substrate in-situ (2026-03-17),
4. 12400881 - Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning (2025-08-26),
5. 12285838 - Wafer edge asymmetry correction using groove in polishing pad (2025-04-29),
6. 12218889 - Asynchronous resumption of dialog session(s) between a user and an automated assistant based on intermediate user interaction(s) (2025-02-04),
7. 12106976 - Steam-assisted single substrate cleaning process and apparatus (2024-10-01),
8. 11951589 - Wafer edge asymmetry correction using groove in polishing pad (2024-04-09),
9. 11931854 - Chemical mechanical polishing using time share control (2024-03-19),
10. 11855988 - Synchronizing access controls between computing devices (2023-12-26),
11. 11823916 - Apparatus and method of substrate edge cleaning and substrate carrier head gap cleaning (2023-11-21),
12. 11780045 - Compensation for substrate doping for in-situ electromagnetic inductive monitoring (2023-10-10),
13. 11768874 - Compact entity identifier embeddings (2023-09-26),
14. 11728185 - Steam-assisted single substrate cleaning process and apparatus (2023-08-15),
15. 11595391 - Synchronizing access controls between computing devices (2023-02-28),

Title: Inventor Wei Guang Lu: Revolutionizing Technology in San Jose

Introduction: Wei Guang Lu is a visionary inventor based in San Jose, CA, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wei Guang Lu holds several patents in the areas of artificial intelligence, machine learning, and robotics, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Wei Guang Lu has worked with leading tech companies in Silicon Valley, where he has spearheaded numerous projects that have had a significant impact on the industry.

Collaborations: Throughout his career, Wei Guang Lu has collaborated with top researchers, engineers, and scientists to bring cutting-edge technologies to life, fostering a culture of innovation and excellence.

Conclusion: Wei Guang Lu's relentless pursuit of innovation and his passion for creating transformative technologies continue to inspire the next generation of inventors and shape the future of the tech industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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