Taoyuan, Taiwan

Wei-En Fu

USPTO Granted Patents = 13 


Average Co-Inventor Count = 4.2

ph-index = 2

Forward Citations = 48(Granted Patents)


Location History:

  • Hsinchu, TW (2016)
  • Chutung, TW (2017)
  • Taoyuan, TW (2016 - 2024)

Company Filing History:


Years Active: 2016-2025

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13 patents (USPTO):Explore Patents

Title: Innovations of Wei-En Fu

Introduction

Wei-En Fu is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of technology, particularly in the areas of inspection methods and X-ray reflectometry. With a total of 12 patents to his name, Fu's work has advanced the capabilities of various technological applications.

Latest Patents

One of his latest patents is an inspection method and inspection platform for lithography. This innovation involves an inspection method applicable for inspecting a light source used to expose a substrate. The method includes steps such as placing inspection components on the substrate's surface and inspecting photon energy of incident light during relative movement. Another notable patent is an X-ray reflectometry apparatus and method for measuring three-dimensional nanostructures on flat substrates. This apparatus comprises an X-ray source, reflector, and a two-dimensional detector, designed to collect reflecting X-ray signals from sample surfaces.

Career Highlights

Wei-En Fu has worked with notable organizations such as the Industrial Technology Research Institute and Taiwan Semiconductor Manufacturing Company. His experience in these institutions has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Throughout his career, Fu has collaborated with esteemed colleagues, including Wen-Li Wu and Guo-Dung Chen. These partnerships have fostered a creative environment that has led to the development of groundbreaking technologies.

Conclusion

Wei-En Fu's contributions to the field of technology through his patents and collaborations highlight his role as a leading inventor. His work continues to influence advancements in inspection methods and X-ray reflectometry, showcasing the importance of innovation in modern technology.

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