The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 09, 2025
Filed:
Sep. 28, 2023
Method for determining parameters of three dimensional nanostructure and apparatus applying the same
Applicant:
Industrial Technology Research Institute, Hsinchu, TW;
Inventors:
Chun-Ting Liu, Taichung, TW;
Po-Ching He, Hsinchu, TW;
Wei-En Fu, Taoyuan, TW;
Chun-Yu Liu, Taipei, TW;
Assignee:
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/201 (2018.01); G01B 15/04 (2006.01); G01N 23/2273 (2018.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 23/201 (2013.01); G01B 15/04 (2013.01); G01N 23/2273 (2013.01); H01L 22/12 (2013.01); G01N 2223/052 (2013.01); G01N 2223/1016 (2013.01);
Abstract
A method for determining parameters of nanostructures, wherein the method includes steps as follows: Firstly, an X-ray reflection intensity measurement curve of a nanostructure to be tested is obtained by radiating the nanostructure to be tested with X-ray. The X-ray reflection intensity measurement curve is compared with an X-ray reflection intensity standard curve to obtain a comparison result. Subsequently, at least one parameter existing in the nanostructure to be tested is determined according to the comparison result.