Wayne M Lytle

Title: Innovations by Wayne M. Lytle in Semiconductor Technology

Introduction

Wayne M. Lytle is an accomplished inventor based in Banks, Oregon, known for his contributions to semiconductor technology. He holds a patent that highlights significant advancements in the preservation of fine pitch redistribution lines, a critical aspect of modern electrical engineering.

Latest Patents

Lytle's notable patent, titled "Preservation of Fine Pitch Redistribution Lines", describes a semiconductor apparatus that includes a redistribution layer. This innovative design features a patterned RDL line with two RDL sidewalls, crafted from materials such as copper (Cu) and gold (Au). The invention incorporates protective sidewalls that directly contact the RDL sidewalls, alongside a seed layer and a barrier layer, with specific dimensions tailored to enhance performance.

Career Highlights

Wayne M. Lytle is currently employed at Intel Corporation, a leader in semiconductor manufacturing and technology. His work at Intel places him at the forefront of innovations that are shaping the technology landscape. Lytle's patent serves as a testament to his expertise in creating solutions that address complex engineering challenges in the semiconductor field.

Collaborations

Throughout his career, Lytle has collaborated with notable colleagues including Kevin J. Lee and Hiten Kothari. These partnerships have likely contributed to the success of his projects and patents, fostering an environment of innovation within the team.

Conclusion

Wayne M. Lytle is a distinguished inventor whose patent work, particularly in the realm of semiconductor technology, is an important contribution to the industry. With an eye on preserving the integrity and efficiency of redistribution lines, his innovations continue to influence the way semiconductors are designed and manufactured. His work at Intel, combined with valuable collaborations, positions him as a significant figure in the field of inventions and technology advancement.