Company Filing History:
Years Active: 2014-2017
Title: Wayne Bao: Innovator in Semiconductor Technology
Introduction
Wayne Bao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on advanced semiconductor devices and their fabrication methods.
Latest Patents
Wayne Bao's latest patents include innovative designs for semiconductor devices. One notable patent is for a semiconductor device with three or four-terminal FinFET. This invention provides methods for simultaneously forming a 3T-FinFET and a 4T-FinFET on the same substrate. The design features a first fin and a second fin on a semiconductor substrate, with the first fin having a top surface higher than the second fin. The patent outlines the formation of gate dielectric layers and gates across the fins, along with an interlayer dielectric layer that covers the gates and substrate. Another significant patent describes a semiconductor device that includes a substrate with a surface and a fin disposed on it. This device incorporates a spacer with a specific type of stress, enhancing its performance.
Career Highlights
Wayne Bao has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International Corp. His experience in these organizations has allowed him to develop and refine his innovative ideas in semiconductor technology.
Collaborations
Wayne has collaborated with talented individuals in his field, including Haibo Xiao and Yanlei Ping. These collaborations have contributed to the advancement of semiconductor technologies and innovations.
Conclusion
Wayne Bao is a distinguished inventor whose work in semiconductor technology has led to multiple patents and significant advancements in the field. His contributions continue to shape the future of semiconductor devices and their applications.