Wataru Ozawa

Title: Wataru Ozawa: Innovator in Plasma Processing Technology

Introduction

Wataru Ozawa is a notable inventor based in Miyagi, Japan, recognized for his contributions to plasma processing technology. With a total of five patents to his name, he has made significant advancements in the field, particularly in methods and apparatuses that enhance plasma processing efficiency.

Latest Patents

Ozawa's latest patents include a "Plasma processing apparatus and plasma processing method." This invention features a controller that operates a high-frequency generating source at varying energy conditions. The controller also manages the gas species supplied to the processing container, ensuring optimal gas flow rates during different phases of the process. Another significant patent is the "Temperature control method, control apparatus, and plasma processing apparatus." This method allows for precise temperature control during multiple steps of a plasma process, enhancing the overall effectiveness of the processing apparatus.

Career Highlights

Throughout his career, Wataru Ozawa has worked with prominent companies, including Tokyo Electron Limited. His experience in these organizations has contributed to his expertise in plasma processing technologies and has facilitated the development of his innovative patents.

Collaborations

Ozawa has collaborated with notable colleagues such as Kimihiro Fukasawa and Takao Funakubo. These partnerships have likely played a role in the advancement of his research and the successful implementation of his inventions.

Conclusion

Wataru Ozawa's contributions to plasma processing technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in plasma processing methods and apparatuses.