Company Filing History:
Years Active: 2016-2022
Title: Wanjuan Zhang: Innovator in Lithographic Technology
Introduction
Wanjuan Zhang is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of lithography, particularly in the development of methods and devices that enhance the quality of mask patterns. With a total of 3 patents to his name, Zhang's work is recognized for its innovative approaches to complex challenges in semiconductor manufacturing.
Latest Patents
Zhang's latest patents include a method for correcting mask patterns and an assistant pattern configuration method. The first patent outlines a comprehensive method for correcting mask patterns by providing a target layout, dividing it into regions, and acquiring position information to arrange auxiliary patterns around main patterns. This method aims to improve the accuracy and quality of lithographic processes. The second patent focuses on configuring assistant patterns around main patterns to optimize focal planes during exposure, thereby enhancing lithographic quality. These innovations reflect Zhang's commitment to advancing semiconductor technology.
Career Highlights
Wanjuan Zhang has worked with notable companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation in Shanghai and Beijing. His experience in these organizations has allowed him to apply his inventive skills to real-world applications, contributing to the advancement of lithographic techniques.
Collaborations
Zhang has collaborated with esteemed colleagues such as Feng Bai and Yibin Huang. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas in the field of semiconductor manufacturing.
Conclusion
Wanjuan Zhang's contributions to lithographic technology through his patents and career achievements highlight his role as a key innovator in the semiconductor industry. His work continues to influence advancements in the field, showcasing the importance of innovation in technology.
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