Wang Nang Wang

This inventor holds 18 USPTO granted patents and 2 published patent applications and 3 EPO patents. Top assignees: Arima Optoelectronics Corporation, Nanogan Limited, Other. Active years: 2000-2018.

USPTO Granted Patents = 18 (Patent Applications = 2)

% Patents Active = 88.9

EPO Patents = 3 (Patent Applications = 5)

Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 210(Granted Patents)

Location History:

Bath, TW (2006)
Bath BA2 7GW, GB (2010)
Bath, GB (2000 - 2016)
Somerset, GB (2018)

Company Filing History:

9 out of 26

Arima Optoelectronics Corporation

5 out of 834,350

Other

patents

Years Active: 2000-2018

Loading Chart...

18 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10023974 - Substrates for semiconductor devices (2018-07-17),

2. 9355840 - High quality devices growth on pixelated patterned templates (2016-05-31),

3. 8828849 - Production of single-crystal semiconductor material using a nanostructure template (2014-09-09),

4. 8652947 - Non-polar III-V nitride semiconductor and growth method (2014-02-18),

5. 8383493 - Production of semiconductor devices (2013-02-26),

6. 8118934 - Non-polar III-V nitride material and production method (2012-02-21),

7. 7915622 - Textured light emitting diodes (2011-03-29),

8. 7906411 - Deposition technique for producing high quality compound semiconductor materials (2011-03-15),

9. 7846751 - LED chip thermal management and fabrication methods (2010-12-07),

10. 7023892 - Semiconductor laser based on matrix, array or single triangle optical cavity with spatially distributed current injection (2006-04-04),

11. 6924511 - Vertical cavity surface emitting semiconductor laser with triangle prism optical cavity resonator (2005-08-02),

12. 6753818 - Concealed antenna for mobile communication device (2004-06-22),

13. 6614060 - Light emitting diodes with asymmetric resonance tunnelling (2003-09-02),

14. 6455870 - Unipolar light emitting devices based on III-nitride semiconductor superlattices (2002-09-24),

15. 6417522 - Led with alternated strain layer (2002-07-09),

Title: Innovations by Inventor Wang Nang Wang in Semiconductor Technology

Introduction

Wang Nang Wang, an accomplished inventor based in Bath, GB, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of 18 patents, he has contributed innovative methods and techniques that further the development of intricate semiconductor components.

Latest Patents

Wang's latest patents showcase his expertise in fabricating advanced semiconductor devices. One of his notable inventions is a method of fabricating a composite semiconductor component that involves the use of a bowed substrate made from synthetic diamond material. This invention intricately details the processes of growing a layer of compound semiconductor material and controlling the thermal expansion mismatch through precise engineering to achieve a flat configuration post-cooling.

Another patent entails the production of a template material for growing semiconductor materials and devices. This method involves creating a pixelated pattern on a dielectric layer, which enhances the quality of device growth by providing structured guidance for semiconductor formation.

Career Highlights

Throughout his career, Wang Nang Wang has collaborated with renowned organizations, including Arima Optoelectronics Corporation. His work is characterized by a strong focus on advancing the capabilities of semiconductor devices and promoting innovation within the industry.

Collaborations

Wang has worked alongside notable peers, such as Yurii Georgievich Shreter and Yurii Toomasovich Rebane. These collaborations have bolstered his research efforts and expanded the practical applications of his inventions within the semiconductor field.

Conclusion

Wang Nang Wang stands out as a prominent figure in semiconductor innovation. His 18 patents reflect his dedication to advancing technology and improving the performance and reliability of semiconductor components. With each invention, he continues to impact the industry, setting a high standard for future advancements in this crucial area of technology.