Company Filing History:
Years Active: 2001-2010
Title: Walter Zygmunt: Innovator in Semiconductor Technology
Introduction
Walter Zygmunt is a prominent inventor based in San Jose, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advanced deposition methods that enhance the performance and reliability of semiconductor materials.
Latest Patents
One of his latest patents is titled "HDP-CVD SiON films for gap-fill." This invention pertains to methods of depositing low stress/high index multi-layer films on a substrate using an HDP-CVD process. The multi-layer films include two lining layers and a bulk gap-fill layer, with the HDP-CVD process employing a reduced substrate bias power during the deposition of at least the second lining layer. The deposition of these three layers occurs at reduced temperatures, which further minimizes stress and improves the films' ability to maintain optical confinement of radiation.
Another notable patent is the "HDP-CVD deposition process for filling high aspect ratio gaps." This method involves forming a silicon oxide layer over a substrate in a high-density plasma substrate processing chamber. The process includes flowing a gas mixture containing silicon, oxygen, and fluorine into the chamber, forming a plasma, and heating the substrate to a temperature above 450°C during the deposition. The resulting silicon oxide layer has a fluorine content of less than 1.0 atomic percent.
Career Highlights
Walter Zygmunt is currently employed at Applied Materials, Inc., a leading company in the semiconductor industry. His innovative work has contributed to advancements in semiconductor manufacturing processes, making them more efficient and reliable.
Collaborations
Walter has collaborated with notable coworkers, including Zhengquan Tan and DongQing Li. Their combined expertise has fostered a productive environment for innovation and development in semiconductor technologies.
Conclusion
Walter Zygmunt's contributions to semiconductor technology through his patents and work at Applied Materials, Inc. highlight his role as a key innovator in the field. His advancements in deposition methods continue to influence the industry positively.