Walter Steinmaier

Title: Walter Steinmaier: Innovator in Semiconductor Technology

Introduction

Walter Steinmaier is a notable inventor based in Nijmegen, Netherlands. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on the development of advanced semiconductor devices and manufacturing methods.

Latest Patents

Steinmaier's latest patents include a semiconductor device with isolated circuit elements and a method of making it. The semiconductor device features a region of a first conductivity type, a semiconductor layer, and buried layers of different conductivity types. This design is particularly suited for the integration of insulated complementary transistor pairs. His method of manufacturing a semiconductor device involves creating an insulated gate field effect transistor, where a second region of the second conductivity type is indiffused into a first region. This innovative approach allows for the formation of a zone of maximum doping concentration, which can be used as a channel stopper.

Career Highlights

Walter Steinmaier is associated with U.S. Philips Corporation, where he has contributed to various projects in semiconductor technology. His expertise has played a crucial role in advancing the capabilities of semiconductor devices.

Collaborations

Steinmaier has worked alongside notable colleagues, including Claude J Le Can and Else Kooi. Their collaborative efforts have furthered research and development in the semiconductor field.

Conclusion

Walter Steinmaier's contributions to semiconductor technology through his patents and collaborations highlight his importance as an inventor in this field. His innovative approaches continue to influence the development of advanced semiconductor devices.