Walter Steinberg

Title: Walter Steinberg: Innovator in Semiconductor Measurement Technologies

Introduction

Walter Steinberg is a notable inventor based in Munich, Germany. He has made significant contributions to the field of semiconductor manufacturing through his innovative patents. With a total of two patents to his name, Steinberg's work focuses on enhancing measurement systems for semiconductor structures.

Latest Patents

Steinberg's latest patents include a "Measuring system for structures on a substrate for semiconductor manufacture." This patent discloses a measuring system with enhanced resolution for periodic structures on a substrate. The system features aperture structures of varying geometries in the illumination beam path, which differ in their light transmission characteristics. This design adjusts the intensity distribution of the diffraction orders in the imaging pupil of the optical system.

Another significant patent is the "Test mask for optical and electron optical systems." This test mask is formed on a quartz substrate and comprises multiple sub-masks. Each sub-mask contains structures that vary in form and size, designed for optical or particle optical measurements according to their dimensions.

Career Highlights

Walter Steinberg is currently associated with Vistec Semiconductor Systems GmbH, where he continues to innovate in the semiconductor field. His work has been instrumental in advancing measurement technologies that are crucial for semiconductor manufacturing processes.

Collaborations

Steinberg has collaborated with notable colleagues, including Hans-Artur Boesser and Gerhard Schlueter. Their combined expertise has contributed to the development of advanced technologies in the semiconductor industry.

Conclusion

Walter Steinberg's contributions to semiconductor measurement technologies through his patents reflect his innovative spirit and dedication to the field. His work continues to influence the industry, paving the way for future advancements.