Vistec Semiconductor Systems Gmbh

Walter Steinberg

Hans-Artur Boesser

Gerhard Schlueter

Michael Ferber

A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system.

Measuring system for structures on a substrate for semiconductor manufacture

A test maskfor microscopy is disclosed, which is formed on a substrate of quartz. The test maskcomprises a multiplicity of sub-masks, which are implemented such that each sub-maskcomprises structures which differ within a sub-maskwith regard to form and size. In addition, the structures of the individual sub-masksare designed for optical or particle optical measurements according to size.

Growing community of inventors

Munich, Georgia

Walter Steinberg