The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2008
Filed:
Jun. 15, 2006
Applicants:
Walter Steinberg, Weilmuenster-Moettau, DE;
Gerhard Schlueter, Wilnsdorf, DE;
Michael Ferber, Wetzlar, DE;
Inventors:
Walter Steinberg, Weilmuenster-Moettau, DE;
Gerhard Schlueter, Wilnsdorf, DE;
Michael Ferber, Wetzlar, DE;
Assignee:
Vistec Semiconductor Systems GmbH, Weilburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A test maskfor microscopy is disclosed, which is formed on a substrate of quartz. The test maskcomprises a multiplicity of sub-masks, which are implemented such that each sub-maskcomprises structures which differ within a sub-maskwith regard to form and size. In addition, the structures of the individual sub-masksare designed for optical or particle optical measurements according to size.