Company Filing History:
Years Active: 2004-2016
Title: **Innovations by Walter Skoczylas: Pioneering Advances in Plasma Technology**
Introduction
Walter Skoczylas, an accomplished inventor located in Aloha, Oregon, has made significant contributions to the field of plasma technology with a total of five patents to his name. His expertise lies in the development of technologies that enhance the functionality and efficiency of charged particle beam systems, facilitating advancements across various applications.
Latest Patents
Among his latest innovations is the patent for a "Method for attachment of an electrode into an inductively-coupled plasma." This inventive approach allows for the inclusion of a plasma reaction chamber with a removably attached source electrode, linked by a fastening mechanism. This design maintains a heat-conductive, vacuum seal, thereby improving the serviceability and reuse of the plasma source tube.
Another notable patent from Skoczylas is "Plasma source for charged particle beam system." This inductively coupled plasma source integrates a dielectric liquid that insulates and cools the plasma chamber, effectively managing heat. Additionally, it features a flow restrictor positioned at an electrical potential that significantly reduces arcing, ensuring that the voltage drop primarily occurs at relatively high pressure.
Career Highlights
Skoczylas has utilized his talents at FEI Company, where he has been pivotal in driving innovations that influence the plasma technology landscape. His work continues to propel advancements in charged particle beam systems that are crucial for various industrial applications.
Collaborations
In his professional journey, Walter has collaborated with esteemed colleagues such as Noel S. Smith and Shouyin Zhang. These partnerships have fostered a dynamic environment for innovation, leading to the successful development of cutting-edge technologies in their field.
Conclusion
Walter Skoczylas stands out as a significant figure in the realm of inventors specializing in plasma technology. His contributions through patented innovations not only enhance the capabilities of focused charged particle beam systems but also pave the way for future advancements in the industry. His ongoing work with FEI Company, alongside talented collaborators, ensures that he remains at the forefront of meaningful technological progress.