The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 2015
Filed:
Jan. 18, 2012
Applicants:
Shouyin Zhang, Portland, OR (US);
Noel Smith, Lake Oswego, OR (US);
Walter Skoczylas, Aloha, OR (US);
Inventors:
Shouyin Zhang, Portland, OR (US);
Noel Smith, Lake Oswego, OR (US);
Walter Skoczylas, Aloha, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); H01J 37/08 (2006.01); H01J 27/16 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 27/16 (2013.01); H01J 2237/002 (2013.01); H01J 2237/006 (2013.01); H01J 2237/026 (2013.01); H01J 2237/038 (2013.01); H01J 2237/0815 (2013.01); H01J 2237/31749 (2013.01);
Abstract
An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.