Company Filing History:
Years Active: 1999-2001
Title: W R Chang: Innovator in Semiconductor Technology
Introduction
W R Chang is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding 2 patents that showcase his innovative approach to solving complex engineering challenges.
Latest Patents
W R Chang's latest patents include a method for forming zig-zag bordered openings in semiconductor structures. This invention discloses a via plug formed in a zig-zag bordered opening in a semiconductor structure, wherein the film stress in a barrier/glue layer of TiN can be significantly reduced. This reduction helps eliminate the occurrence of volcano defects, which involve delamination or peeling of the TiN layer from the contact opening. The method can be easily executed by providing a mask with a desirable zig-zag pattern during a photomasking step performed on the semiconductor device.
Career Highlights
W R Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to push the boundaries of semiconductor innovation. His work has been instrumental in enhancing the reliability and performance of semiconductor devices.
Collaborations
Some of his notable coworkers include C H Chen and Y C Chao, who have collaborated with him on various projects within the semiconductor industry.
Conclusion
W R Chang's contributions to semiconductor technology through his innovative patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key figure in the advancement of this critical field. His inventions not only address existing challenges but also pave the way for future developments in semiconductor manufacturing.