Hillsboro, OR, United States of America

Václav Batelka

This inventor holds 1 USPTO granted patent. Top assignee: Fei Comapny. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Václav Batelka. Retrieved from https://idiyas.com/inventor/václav-batelka

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Václav Batelka: Innovator in Helical Tomography

Introduction

Václav Batelka is a notable inventor based in Hillsboro, OR (US). He has made significant contributions to the field of imaging technology, particularly in helical tomography. His innovative approach has led to advancements that enhance the quality of imaging while minimizing sample exposure.

Latest Patents

Václav Batelka holds a patent titled "Illumination apertures for extended sample lifetimes in helical tomography." This patent describes apertures with reference edges that define a sample irradiation zone and a shielded zone. The design allows for a sample to be scanned into the irradiation zone from the shielded zone, ensuring that the sample remains unexposed until it is properly aligned with the detector for imaging. This method reduces irradiation exposure, thereby permitting superior imaging results. He has 1 patent to his name.

Career Highlights

Václav Batelka is associated with Fei Company, where he applies his expertise in imaging technology. His work has been instrumental in developing methods that improve the efficiency and effectiveness of imaging processes.

Collaborations

Some of his notable coworkers include Ondrej Ludmil Shanel and Trond Karsten Varslot. Their collaborative efforts contribute to the innovative environment at Fei Company.

Conclusion

Václav Batelka's contributions to helical tomography exemplify the impact of innovation in imaging technology. His patent work and collaboration with talented colleagues continue to push the boundaries of what is possible in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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