The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 30, 2022
Filed:
Dec. 29, 2020
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Ondrej L. Shanel, Brno, CZ;
Trond Karsten Varslot, Vuku, NO;
Martin Schneider, Brno, CZ;
Maarten Kuijper, Helmond, NL;
Ondrej R. Baco, Pristpo, CZ;
Václav Batelka, Hillsboro, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/09 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/09 (2013.01); H01J 37/20 (2013.01); H01J 2237/0451 (2013.01);
Abstract
Apertures having references edges are situated to define a sample irradiation zone and a shielded zone. The sample irradiation zone includes a portion proximate the shielded zone that is conjugate to a detector. A sample is scanned into the sample irradiation zone from the shielded zone so that the sample can remain unexposed until situated properly with respect to the detector for imaging. Irradiation exposure of the sample is reduced, permitting superior imaging.