Radebeul, Germany

Volker Jaschke

USPTO Granted Patents = 4 

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2012-2015

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4 patents (USPTO):Explore Patents

Title: Volker Jaschke: Innovator in Semiconductor Technology

Introduction

Volker Jaschke is a prominent inventor based in Radebeul, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on enhancing the performance and reliability of advanced semiconductor devices.

Latest Patents

One of his latest patents is titled "Multi-step deposition of a spacer material for reducing void formation in a dielectric material of a contact level of a semiconductor device." This innovation involves the formation of spacer elements using a multi-station deposition technique. By varying the thickness of the sub-layers of spacer materials, Jaschke aims to improve etch conditions during the anisotropic etch process. This advancement leads to better-shaped spacer elements, which in turn enhances deposition conditions when utilizing stress-inducing dielectric materials. As a result, yield losses due to contact failures in densely packed device areas, such as static RAM areas, can be significantly reduced.

Another notable patent is "Oxide deposition by using a double liner approach for reducing pattern density dependence in sophisticated semiconductor devices." In this patent, Jaschke describes a method of providing silicon dioxide material in the form of a double liner. This includes an undoped silicon dioxide material combined with high-density plasma silicon dioxide, which reduces dependency on pattern density. The silicon dioxide double liner can serve as both a spacer material and a hard mask material in process strategies for incorporating strain-inducing semiconductor materials.

Career Highlights

Volker Jaschke has built a successful career at Globalfoundries Inc., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

Throughout his career, Jaschke has collaborated with notable colleagues, including Hartmut Ruelke and Frank Seliger. These partnerships have further enhanced his work and contributions to semiconductor advancements.

Conclusion

Volker Jaschke's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a commitment to improving device performance and reliability, making him a valuable contributor to the industry.

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