Location History:
- San Jose, CA (US) (2006 - 2010)
- Mountain View, CA (US) (2010)
Company Filing History:
5 out of 10 
1 out of 1 
1 out of 2 Years Active: 2006-2010
Title: The Innovations of Vladimir Faifer
Introduction
Vladimir Faifer is a notable inventor based in San Jose, California. He has made significant contributions to the field of measurement technology, particularly in the area of sheet resistance measurement for p-n junctions. With a total of nine patents to his name, Faifer's work has advanced the understanding and application of non-contact measurement methods.
Latest Patents
One of Faifer's latest patents is a non-contact method and apparatus for the measurement of sheet resistance of p-n junctions. This innovative apparatus utilizes a contactless approach to measure the sheet resistance of the upper layer of ultra-shallow p-n junctions. The design includes an alternating light source that is optically coupled with a transparent and conducting electrode positioned close to the wafer. A second electrode is placed outside the illumination area. By measuring the surface photovoltage signals both inside and outside the illuminated area, along with their phase shifts, Faifer's linear SPV model effectively describes the lateral distribution of sheet resistance and p-n junction conductance.
Career Highlights
Throughout his career, Vladimir Faifer has worked with various companies, including Ahbee 1, L.P. His experience in the industry has allowed him to develop and refine his innovative measurement techniques. Faifer's contributions have been instrumental in enhancing the accuracy and efficiency of sheet resistance measurements.
Collaborations
Faifer has collaborated with notable individuals in his field, including Phuc Van and Michael I Current. These collaborations have further enriched his work and contributed to the development of advanced measurement technologies.
Conclusion
Vladimir Faifer's innovative work in the field of non-contact measurement methods has made a significant impact on the technology surrounding p-n junctions. His nine patents reflect his dedication to advancing measurement techniques, and his collaborations with other professionals highlight the importance of teamwork in innovation.