Waterbury, CT, United States of America

Vincent Paneccasio

USPTO Granted Patents = 3 

 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Company Filing History:


Years Active: 2019-2025

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3 patents (USPTO):Explore Patents

Title: Vincent Paneccasio: Innovator in Microelectronics

Introduction

Vincent Paneccasio is a notable inventor based in Waterbury, CT (US). He has made significant contributions to the field of microelectronics, particularly in the area of copper deposition processes. With a total of 3 patents to his name, his work has had a substantial impact on manufacturing techniques in this industry.

Latest Patents

One of Vincent's latest patents focuses on leveler compositions for use in copper deposition in the manufacture of microelectronics. This invention involves an aqueous electrolytic composition and a process for electrodeposition of copper on a dielectric or semiconductor base structure. The process includes contacting a metalizing substrate, which comprises a seminal conductive layer on the base structure, with the aqueous electrolytic deposition composition. Additionally, electrical current is supplied to the electrolytic deposition composition to deposit copper on the substrate. The aqueous electrolytic composition consists of copper ions, an acid, a suppressor, and a quaternized poly(epihalohydrin) comprising repeating units corresponding to specific structures.

Career Highlights

Vincent has worked with reputable companies in the industry, including Macdermid Enthone GmbH and Enthone Incorporated. His experience in these organizations has allowed him to refine his expertise in microelectronics and contribute to innovative solutions in the field.

Collaborations

Throughout his career, Vincent has collaborated with talented individuals such as Kyle M. Whitten and Thomas B. Richardson. These collaborations have further enhanced his work and led to advancements in the technologies he has developed.

Conclusion

Vincent Paneccasio is a distinguished inventor whose work in microelectronics has paved the way for advancements in copper deposition processes. His contributions continue to influence the industry and inspire future innovations.

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