Vincent M Donnelly

Title: Vincent M Donnelly: Innovator in Atomic Layer Etching

Introduction

Vincent M Donnelly is a prominent inventor based in Houston, TX, known for his groundbreaking contributions to the field of nanotechnology and plasma etching. With a portfolio of seven patents, Donnelly continues to push the boundaries of innovation, focusing on techniques that enhance the precision and efficiency of fabrication processes.

Latest Patents

Donnelly's latest patents showcase his expertise in atomic layer etching and nanopatterning methodologies. One of his noteworthy inventions is related to a system and method for rapid atomic layer etching (ALET). This innovative approach utilizes a pulsed plasma source, integrated with a spiral coil electrode, a cooled Faraday shield, and a counter electrode within a specialized reaction chamber. The method enables precise removal of product layers from a substrate through pulsed plasma, revolutionizing the etching process.

Additionally, he has developed systems and methods for rapidly fabricating nanopatterns over large areas, known as nanopantography. This technique facilitates the patterning of nanofeatures with high aspect ratios by employing selective plasma etching in conjunction with a silicon oxide hard mask. This method greatly enhances patterning speed while ensuring minimal mask undercut, allowing for the fabrication of complex patterns efficiently.

Career Highlights

Vincent M Donnelly has held significant positions at esteemed research institutions and companies, including the University of Houston System and Tokyo Electron Limited. His professional journey is marked by a commitment to advancing technology in the field of etching and patterning, making significant strides in both academic and industrial settings.

Collaborations

Throughout his career, Donnelly has collaborated with notable professionals in the field, including Demetre J Economou and Lee Chen. These partnerships underscore the collaborative spirit of innovation that characterizes the field of nanotechnology and etching processes.

Conclusion

Vincent M Donnelly stands as a notable figure in the realm of inventions related to atomic layer etching and nanopatterning. His patents reflect a dedication to enhancing fabrication techniques, positioning him as a leading innovator in his field. As he continues to develop new technologies, his contributions are expected to have a profound impact on various applications within nanotechnology.