Vanessa Faune

Title: Innovations by Inventor Vanessa Faune

Introduction

Vanessa Faune is a prominent inventor based in San Jose, CA (US). She has made significant contributions to the field of physical vapor deposition (PVD) methods, holding a total of 6 patents. Her work focuses on improving processes that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of her latest patents is titled "Method for particle removal from wafers through plasma modification in pulsed PVD." This invention discloses physical vapor deposition methods aimed at reducing the particulates deposited on substrates. The process involves increasing the pressure during sputtering to promote agglomeration of particulates formed in the plasma. The agglomerated particulates can then be moved to an outer portion of the process chamber before the plasma is extinguished, allowing them to fall harmlessly outside the diameter of the substrate.

Another notable patent is "Process kit geometry for particle reduction in PVD processes." This invention describes a process kit that includes a shield and ring assembly designed to minimize the deposition of process deposits on internal chamber components and the overhang edge of the substrate. The shield features a cylindrical band with a top wall that surrounds a sputtering target, while the ring assembly includes a cover ring with a bulb-shaped protuberance that blocks the line-of-sight between gas conductance holes and the entrance to the chamber body cavity.

Career Highlights

Vanessa Faune has established herself as a key figure in her field through her innovative work at Applied Materials, Inc. Her expertise in PVD processes has led to advancements that benefit the semiconductor industry.

Collaborations

Throughout her career, Vanessa has collaborated with notable colleagues, including Adolph Miller Allen and Kirankumar Neelasandra Savandaiah. These partnerships have contributed to her success and the development of her patented technologies.

Conclusion

Vanessa Faune's contributions to the field of semiconductor manufacturing through her innovative patents demonstrate her expertise and commitment to advancing technology. Her work continues to influence the industry positively.