The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2021
Filed:
Nov. 27, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Adolph Miller Allen, Oakland, CA (US);
William Johanson, Gilroy, CA (US);
Viachslav Babayan, Sunnyvale, CA (US);
Zhong Qiang Hua, Saratoga, CA (US);
Carl R. Johnson, Tracy, CA (US);
Vanessa Faune, San Jose, CA (US);
Jingjing Liu, Milpitas, CA (US);
Vaibhav Soni, Sunnyvale, CA (US);
Kirankumar Savandaiah, Bangalore, IN;
Sundarapandian Ramalinga Vijayalaks Reddy, Bangalore, IN;
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Apparatus and methods for reducing and eliminating accumulation of excessive charged particles from substrate processing systems are provided herein. In some embodiments a process kit for a substrate process chamber includes: a cover ring having a body and a lip extending radially inward from the body, wherein the body has a bottom, a first wall, and a second wall, and wherein a first channel is formed between the second wall and the lip; a grounded shield having a lower inwardly extending ledge that terminates in an upwardly extending portion configured to interface with the first channel of the cover ring; and a bias power receiver coupled to the body and extending through an opening in the grounded shield.