The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Jun. 12, 2019
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Adolph M. Allen, Oakland, CA (US);

Vanessa Faune, San Jose, CA (US);

Zhong Qiang Hua, Saratoga, CA (US);

Kirankumar Neelasandra Savandaiah, Bangalore, IN;

Anantha K. Subramani, San Jose, CA (US);

Philip A. Kraus, San Jose, CA (US);

Tza-Jing Gung, San Jose, CA (US);

Lei Zhou, San Jose, CA (US);

Halbert Chong, San Jose, CA (US);

Vaibhav Soni, Sunnyvale, CA (US);

Kishor Kalathiparambil, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01J 37/34 (2006.01); C23C 16/455 (2006.01); C23C 14/54 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32862 (2013.01); C23C 14/541 (2013.01); C23C 16/455 (2013.01); H01J 37/3244 (2013.01); H01J 37/3441 (2013.01);
Abstract

Embodiments of process kit shields and process chambers incorporating same are provided herein. In some embodiments a process kit configured for use in a process chamber for processing a substrate includes a shield having a cylindrical body having an upper portion and a lower portion; an adapter section configured to be supported on walls of the process chamber and having a resting surface to support the shield; and a heater coupled to the adapter section and configured to be electrically coupled to at least one power source of the processes chamber to heat the shield.


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