Valery V Felmetsger

Title: Innovations of Valery V Felmetsger

Introduction

Valery V Felmetsger is a notable inventor based in Ventura, CA (US). He has made significant contributions to the field of reactive sputtering, holding a total of 5 patents. His work focuses on enhancing the properties of deposited films through innovative techniques.

Latest Patents

One of his latest patents involves a stress adjustment mechanism in reactive sputtering. In a dual cathode magnetron, an adjustment circuit is provided between a pair of sputter targets that have a coaxial relationship. This circuit modifies the distribution of ion and electron currents flowing from the plasma discharge to a substrate within a sputter chamber. The stress adjustment circuit is crucial for controlling the ion bombardment of the growing films on the substrate, which ultimately affects the stress in the deposited films. A preferred embodiment of this invention includes a variable resistor placed between an internal shield acting as a passive anode and a target. The variable resistor's value influences the plasma discharge current distribution, allowing for effective adjustments to the properties of the deposited films.

Career Highlights

Throughout his career, Valery has worked with several companies, including Oem Group, LLC and Tegal Corporation. His experience in these organizations has contributed to his expertise in the field of sputtering technology.

Collaborations

Valery has collaborated with various professionals, including Pavel N Laptev. His partnerships have fostered innovation and development in his projects.

Conclusion

Valery V Felmetsger's contributions to the field of reactive sputtering demonstrate his innovative spirit and technical expertise. His patents reflect a commitment to advancing technology in film deposition processes.