Company Filing History:
Years Active: 2015
Title: Innovations by Valerio Perez in Lithography Technology
Introduction
Valerio Perez is a notable inventor based in Singapore, recognized for his contributions to the field of lithography technology. With a total of two patents to his name, he has made significant advancements that enhance the process of forming integrated circuits.
Latest Patents
Valerio's latest patents include "Topography Driven OPC and Lithography Flow" and "Surface Topography Enhanced Pattern (STEP) Matching." The first patent discloses enhancements in lithography for forming integrated circuits, which involve a topography analysis of design data files to obtain accumulative topography information for different mask levels. This information facilitates topography-driven optical proximity correction and lithography. The second patent presents a design or lithographic enhancement process, a method for forming a device based on this process, and a system for pattern enhancement. It includes processing a design data file that contains information about design layers in an integrated circuit. The process involves analyzing the design data file and enhancing patterns while considering the topography information of design layers corresponding to the masks of the integrated circuit.
Career Highlights
Valerio Perez works at Globalfoundries Singapore Pte. Ltd., where he applies his expertise in lithography technology. His work has contributed to the advancement of integrated circuit manufacturing, making processes more efficient and effective.
Collaborations
Valerio collaborates with talented coworkers, including Ushasree Katakamsetty and Wee Kwong Yeo, who contribute to the innovative environment at Globalfoundries.
Conclusion
Valerio Perez's work in lithography technology showcases his innovative spirit and dedication to enhancing integrated circuit manufacturing processes. His patents reflect significant advancements that are likely to influence the future of the industry.