Göttingen, Germany

Uwe Leinhos


Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 47(Granted Patents)


Company Filing History:


Years Active: 2001-2002

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5 patents (USPTO):Explore Patents

Title: Uwe Leinhos: Innovator in Laser Technology

Introduction

Uwe Leinhos is a prominent inventor based in Göttingen, Germany. He has made significant contributions to the field of laser technology, holding a total of 5 patents. His work focuses on enhancing the performance and accuracy of excimer lasers, which are widely used in various applications, including lithography.

Latest Patents

One of Uwe Leinhos's latest patents is titled "Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines." This invention provides a method for calibrating the absolute wavelength of a narrowed emission from an ArF-excimer laser. The calibration process involves using photoabsorbing species, such as atomic carbon or molecular oxygen, to ensure precision in laser output. Another notable patent is "Optical pulse stretching and smoothing for ArF and F2 lithography excimer lasers." This invention describes a method and apparatus for temporally stretching and smoothing the pulses of excimer and lithography lasers, enhancing their performance.

Career Highlights

Uwe Leinhos has been associated with Lambda Physik AG, a company known for its advancements in laser technology. His innovative work has contributed to the development of high-precision laser systems that are essential in various industrial applications.

Collaborations

Throughout his career, Uwe has collaborated with notable colleagues, including Uwe Stamm and Wolfgang Zschocke. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Uwe Leinhos is a distinguished inventor whose work in laser technology has led to significant advancements in the field. His patents reflect a commitment to precision and innovation, making him a key figure in the development of excimer lasers.

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