This inventor holds 10 USPTO granted patents and 1 published patent application. Top assignees: Applied Materials, Inc., Mentor Graphics Corporation. Active years: 2014-2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2014-2025
Title: Uwe Hollerbach: Innovator in Digital Lithography Systems
Introduction
Uwe Hollerbach is a prominent inventor based in Fremont, CA, known for his significant contributions to the field of digital lithography systems. With a total of 10 patents to his name, Hollerbach has made remarkable advancements that enhance the precision and efficiency of lithographic processes.
Latest Patents
One of his latest patents focuses on controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems. This innovation allows a digital lithography system to adjust the wavelength of the light source to compensate for tilt errors in micromirrors while maintaining a perpendicular direction for the reflected light. The phase shift between adjacent pixels can be preselected based on the optical path difference between their respective light beams. By generating a specific wavelength that corresponds to the desired phase shift, the light source can produce multiple light components with controlled intensities to achieve the selected phase shift on the substrate. Another notable patent involves the dynamic generation of layout adaptive packaging, which provides a method for attaching wiring connections to a component using both design and field-measured data to ensure accurate wiring connections.
Career Highlights
Throughout his career, Uwe Hollerbach has worked with leading companies in the technology sector, including Applied Materials, Inc. and Mentor Graphics Corporation. His work in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in the industry.
Collaborations
Hollerbach has collaborated with notable professionals in his field, including Thomas L Laidig and Christopher Dennis Bencher. These collaborations have further enriched his work and have led to the development of groundbreaking technologies.
Conclusion
Uwe Hollerbach's contributions to digital lithography systems and his innovative patents demonstrate his expertise and commitment to advancing technology. His work continues to influence the industry and pave the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile