The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2019
Filed:
Mar. 23, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Uwe Hollerbach, Fremont, CA (US);
Thomas L. Laidig, Richmond, CA (US);
Mark Hunt, Morgan Hill, CA (US);
Don Starses, Cupertino, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
A real time software and array control software application platform which maintains the ability to manage the synchronization between substrate alignments and image projection systems during maskless lithography patterning in a manufacturing process is disclosed. The application coordinates and controls the image projection systems such that discrepancies in and misalignments of the substrate may be determined and accounted for in real time. The image projection systems may run in parallel and may be controlled by a central processor.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile