Urbain Leopold Laridon

Title: Urbain Leopold Laridon: Innovator in Photoresist Technologies

Introduction

Urbain Leopold Laridon is a notable inventor based in Wilrijk, Belgium. He has made significant contributions to the field of photoresist materials, holding a total of nine patents. His work has advanced the technology used in photosensitive recording materials, which are essential in various applications, including semiconductor manufacturing.

Latest Patents

Among his latest patents, Laridon has developed innovative photoresist materials and processes. One of his notable inventions is a photosensitive recording material that includes a supported layer with a mixture of photosensitive substances and polymers soluble in alkaline aqueous liquids. This mixture essentially consists of at least one photosensitive nitrone, which features an aromatic hydrocarbon group. Another significant patent involves a photosensitive composition designed for producing polymer resist images, comprising a mixture of ethylenically unsaturated components.

Career Highlights

Throughout his career, Urbain Leopold Laridon has worked with prominent companies, including Agfa Gevaert NV. His expertise in photoresist technologies has positioned him as a key figure in the development of advanced materials used in various high-tech industries.

Collaborations

Laridon has collaborated with notable individuals in his field, including Hendrik E Kokelenberg and Albert Lucien Poot. These collaborations have contributed to the advancement of photoresist technologies and have fostered innovation in the industry.

Conclusion

Urbain Leopold Laridon is a distinguished inventor whose work in photoresist materials has had a lasting impact on technology. His nine patents reflect his commitment to innovation and excellence in the field.